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Impact of gas heating in inductively coupled plasmas

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6 Author(s)
Hash, D.B. ; NASA Ames Research Center, Moffett Field, California 94035 ; Bose, D. ; Rao, M.V.V.S. ; Cruden, B.A.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1390503 

Recently it has been recognized that the neutral gas in inductively coupled plasma reactors heats up significantly during processing. The resulting gas density variations across the reactor affect reaction rates, radical densities, plasma characteristics, and uniformity within the reactor. A self-consistent model that couples the plasma generation and transport to the gas flow and heating has been developed and used to study CF4 discharges. A Langmuir probe has been used to measure radial profiles of electron density and temperature. The model predictions agree well with the experimental results. As a result of these comparisons along with the poorer performance of the model without the gas–plasma coupling, the importance of gas heating in plasma processing has been verified. © 2001 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:90 ,  Issue: 5 )

Date of Publication:

Sep 2001

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