Films of fcc Ni3Al with suppressed short‐range order (SRO) were prepared by physical vapor deposition of Ni3Al onto room‐temperature substrates. Extended electron energy‐loss fine‐structure spectra were obtained from both Al K and Ni L23 edges. After the samples were annealed for various times at 150 °C, a moderate growth of SRO was observed in the first‐nearest‐neighbor environments of both the Al and Ni atoms. As prepared, these fcc Ni3Al materials, and presumably others having similar heat evolutions as measured by differential scanning calorimetry, have a high degree of chemical disorder. © 1995 American Institute of Physics.