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The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an ‘‘eyelash’’ in cross‐sectional transmission electron microscopy and like a ‘‘black belt’’ in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.