Cart (Loading....) | Create Account
Close category search window

Crystallographic structure of CoPtCr/CrV thin films as revealed by cross‐section TEM and x‐ray pole‐figure analysis and its relevance to magnetic properties

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Parker, M.A. ; IBM, Advanced Storage and Retrieval, 5600 Cottle Road, San Jose, California 95193 ; Howard, J.K. ; Ahlert, R. ; Coffey, K.R.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The crystallographic structure and coercive force of Co75Pt12Cr13/CrVx bilayer films sputter deposited on NiP/AlMg disks used in longitudinal magnetic recording were characterized as a function of varying V content from pure Cr through pure V. The coercive force of the CoPtCr peaked at an intermediate composition of the CrVx sublayer. The origin of this effect was elucidated by x‐ray diffraction, x‐ray pole‐figure analysis, cross‐section TEM, and elongated probe microdiffraction. The improving degree of epitaxy between the CoPtCr and the CrVx sublayer, the increasing fraction of Cr grains favoring the growth of (112¯0) Co grains with c axis in‐plane, a narrowing of the mosaic spread in the orientation of Co grains, and an increasing size of Co regions with the ≪112¯0≳ fiber axis orientation as CrVx composition approaches values between 80/20 and 50/50 Cr/V content account for the observed coercivity increase.

Published in:

Journal of Applied Physics  (Volume:73 ,  Issue: 10 )

Date of Publication:

May 1993

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.