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Mössbauer study of the amorphization process induced in α‐Fe by boron implantation

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3 Author(s)
Jagielski, Jacek ; Institute of Electronic Materials Technology, Wólczyńska Street 133, 01‐919 Warsaw, Poland ; Kopcewicz, Michal ; Thome, Lionel

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Amorphization of iron by boron implantation was studied by conversion electron Mössbauer spectroscopy and Rutherford backscattering techniques. The results indicate that the amorphization process depends on the thickness of the sample. After implantation at RT, the amorphous fraction amounting to 0.85 was found for 150 nm thick iron film whereas in the bulk sample this fraction reached only about 0.65. The residual crystalline α‐Fe phase persists in the sample amorphized by B implantation in a wide concentration range corresponding to nominal compositions from Fe90B10 to Fe65B35 in clear distinction from melt‐spun and sputtered samples.

Published in:

Journal of Applied Physics  (Volume:73 ,  Issue: 10 )