By Topic

Cross correlation of optical properties of thin films under thermal radiation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Wong, Peter Y. ; Thermal Analysis of Materials Processing Laboratory, Mechanical Engineering Department, Tufts University, Medford, Massachusetts 02155 ; Trefethen, Lloyd M. ; Miaoulis, I.N.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.352054 

Optical property and temperature distributions of a multilayer thin‐ (∼1 μm) film structure exposed to thermal radiation (1 μm≤λ≤8 μm) are dependent on film thicknesses, geometry, and material properties. Film thickness variation, simulated numerically, resulted in local minima and maxima in reflectivity and temperature distribution of these structures. We attribute this to a cross correlation phenomenon that occurs when the optical thickness of any two films in the structure is equal over a broad radiation spectrum.

Published in:

Journal of Applied Physics  (Volume:72 ,  Issue: 10 )