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An electron‐beam pumped XeF(C‐A) laser has been operated as an injection controlled oscillator. The electron‐beam pump rate was 290 kW/cm3 and the pulse length was 600 ns. An etalon controlled dye laser was used as the injection source and reduced the free‐running laser linewidth from 16 to 0.003 nm. The intrinsic laser efficiency of the injection controlled XeF(C‐A) excimer was 1.8% with a specific output energy of 3 J/l, exceeding the free‐running performance.