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Browse Journals & Magazines > Journal of Applied Physics ...> Volume:70 Issue:10 Help

Analysis of magnetic anisotropies in ultrathin films by magnetometry in situ in UHV (invited)

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4 Author(s)
Elmers, H.J. ; Physikalisches Institut, Technische Universität Clausthal, W 3392 Clausthal‐Zellerfeld, Germany ; Furubayashi, T. ; Albrecht, M. ; Gradmann, U.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.350155 

Magnetic anisotropies of Ni(111) films on Re(0001) and Fe(110) films on W(110) were analyzed using torsion oscillating magnetometry in UHV. They can be decomposed in volume contributions that are independent of thickness and surface state and can be explained as a superposition of shape, magnetocrystalline and residual strain anisotropies, and surface contributions, which scale with 1/d and depend sensitively on the state of the surface. Néel’s phenomenological anisotropy model provides a useful connection between different components of surface anisotropies.

Published in:
Journal of Applied Physics  (Volume:70 ,  Issue: 10 )

Date of Publication: Nov 1991

Page(s):
5764 - 5768
ISSN :
0021-8979
Digital Object Identifier :
10.1063/1.350155
Date of Current Version :
07 July 2009
Issue Date :
Nov 1991

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