By Topic

Field emission enhancement in ultrananocrystalline diamond films by in situ heating during single or multienergy ion implantation processes

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
7 Author(s)
Joseph, P.T. ; Department of Materials Science and Engineering, National Tsing-Hua University, Taiwan 300, Republic of China ; Tai, N.H. ; Chen, C.-H. ; Niu, H.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The single or multienergy nitrogen (N) ion implantation (MENII) processes with a dose (4×1014 ions/cm2) just below the critical dose (1×1015 ions/cm2) for the structural transformation of ultrananocrystalline diamond (UNCD) films were observed to significantly improve the electron field emission (EFE) properties. The single energy N ion implantation at 300 °C has shown better field emission properties with turn-on field (E0) of 7.1 Vm, as compared to room temperature implanted sample at similar conditions (E0=8.0 Vm) or the pristine UNCD film (E0=13.9 Vm). On the other hand, the MENII with a specific sequence of implantation pronouncedly showed different effect on altering the EFE properties for UNCD films, and the implantation at 300 °C further enhanced the EFE behavior. The best EFE characteristics achieved for the UNCD film treated with the implantation process are E0=4.5 Vm and current density of (Je)=2.0 mA/cm2 (at 24.5 Vm). The prime factors for improving the EFE properties are presumed to be the grain boundary incorporation and activation of the implanted N and the healing of induced defects, which are explained based on surface charge transfer doping mechanism.

Published in:

Journal of Applied Physics  (Volume:105 ,  Issue: 12 )