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Browse Journals & Magazines > Journal of Applied Physics ...> Volume:105 Issue:7 Help

Erratum: “Band alignment of yttrium oxide on various relaxed and strained semiconductor substrates” [J. Appl. Phys. 103, 083702 (2008)]

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2 Author(s)
Chiam, S.Y. ; Department of Physics, Imperial College London, Blackett Laboratory, Prince Consort Road, London SW7 2BW, United Kingdom ; Chim, W.K.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3106056 

First Page of the Article

Published in:
Journal of Applied Physics  (Volume:105 ,  Issue: 7 )

Date of Publication: Apr 2009

Page(s):
079901 - 079901-1
ISSN :
0021-8979
Digital Object Identifier :
10.1063/1.3106056
Product Type:
Journals & Magazines
Date of Current Version :
24 June 2009
Issue Date :
Apr 2009

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