Cart (Loading....) | Create Account
Close category search window
 

Homoepitaxy of ZnO on bulk and thin film substrates by low temperature metal organic chemical vapor deposition using tert-butanol

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Sartel, C. ; Groupe d’étude de la matière condensée (GEMAC), CNRS-Université de Versailles St Quentin, 1 Place Aristide Briand, 92195 Meudon Cedex, France ; Sallet, V. ; Lusson, A. ; Haneche, N.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3137016 

Homoepitaxial growths of ZnO were performed by low pressure metal organic chemical vapor deposition (MOCVD) on both bulk hydrothermal and thin film buffer layers of ZnO grown by pulsed laser deposition on c-sapphire substrates. The surface roughness, photoluminescence, and x-ray diffraction (0002) peak omega rocking-curve line widths for the bulk and thin film substrates were similar prior to MOCVD growth. After MOCVD growth, it was found that the surface morphology, crystallographic quality, and optical properties of the ZnO layers were far superior to those typically observed for heteroepitaxial growth of ZnO layers on c-sapphire by MOCVD. The MOCVD layers were comparable for growths on both the bulk substrate and the thin film buffer layer. Furthermore, no significant impact of carrier gas was observed. The quality of the ZnO layer appeared to be correlated with the surface morphology and the crystalline quality of the substrate rather than being dependent on whether the substrate was in bulk or thin film form.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:27 ,  Issue: 3 )

Date of Publication:

May 2009

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.