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High index contrast polysiloxane waveguides fabricated by dry etching

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5 Author(s)
Madden, S.J. ; Laser Physics Centre, Research School of Physical Science and Engineering, Australian National University, Canberra ACT 0200, Australia ; Zhang, M.Y. ; Choi, D.-Y. ; Luther-Davies, B.
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The authors demonstrate the production of low loss enhanced index contrast waveguides by reactive ion etching of IPG™ polysiloxane thin films. The use of a silica mask and CHF3/O2 etch gas led to large etch selectivity between the silica and IPG™ of ≫20 and etch rates of ≫100 nm/min. This work indicates that compact optical circuits could be successfully fabricated for telecommunication applications using polysiloxane films.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:27 ,  Issue: 3 )