By Topic

Base Region Transport Characteristics of a Diffused Transistor

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Kennedy, David P. ; International Business Machines Corporation, Poughkeepsie, New York ; Murley, Philip C.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

A one‐dimensional analysis is given on the minority carrier transport characteristics of a transistor base region containing an arbitrary drift field distribution. This field is assumed to enhance—or retard—the motion of minority carriers between an emitter and collector junction, thereby modifying the influence of bulk recombination mechanisms. Base region transport efficiency is established in terms of the transistor current gain when an ideal emitter junction is assumed. Applications of this analysis are demonstrated by establishing the base region transport efficiency for diffused transistors. Two types of structures have been analytically investigated: the alloy‐diffused transistor, containing a diffused collector junction and an alloy‐type emitter; and the double‐diffused transistor constructed entirely by diffusion techniques. For practical semiconductor devices, a comparison of these two structures has shown negligible differences in their base region transport efficiency and, furthermore, the drift mechanisms within these diffused devices have little influence upon their one‐dimensional current gain.

Published in:

Journal of Applied Physics  (Volume:33 ,  Issue: 1 )