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Young's modulus and internal friction measurements are reported on high‐purity copper following electron bombardment. The modulus is observed to rise rapidly with electron flux reaching an early saturation followed by a slow decrease. The rapid saturation is attributed to dislocation pinning. The rate of saturation is temperature dependent in the range from -195°C to about 0°C suggesting defect migration at low temperatures. The slow decrease is attributed to a ``bulk effect'' due to interstitial‐vacancy pairs.