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Cathodic Sputtering for Micro‐Diffusion Studies

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2 Author(s)
Fisher, Thomas F. ; General Electric Company, Knolls Atomic Power Laboratory, Schenectady, New York ; Weber, C.E.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1702170 

A method which has been developed to allow uniform removal of micro‐layers of metal from cylindrical specimens is based on sputtering of the metal from the cathode of a gas glow discharge tube. This technique is directly applicable to diffusion studies and offers many advantages over other more common methods.

Published in:

Journal of Applied Physics  (Volume:23 ,  Issue: 2 )