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Phase formation in Au‐Al and Cu‐Al thin‐film systems under ion beam bombardment

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4 Author(s)
Chang, Chu Te ; Istituto Dipartimentale di Fisica dell’Universitá, Corso Italia 57, I95129 Catania, Italy ; Campisano, S.U. ; Cannavo, S. ; Rimini, E.

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Au‐Al and Cu‐Al thin film bilayers were bombarded at 80 K with Kr+ ions of 60–240 keV energy. The Au2Al+AuAl2 and Al4Cu9 phases formed during bombardment and they were investigated by backscattering and x‐ray diffraction techniques. In all the cases the growth kinetics is linear with the parameter (fluence × interfacial deposited energy density)1/2 suggesting a correlation with a diffusion‐like process. Comparison with calculations of diffusion enhanced within the collision cascade gives good agreement with the experimental results.

Published in:

Journal of Applied Physics  (Volume:55 ,  Issue: 9 )

Date of Publication:

May 1984

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