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Surface modification techniques such as ion implantation, laser alloying, and ion beam mixing are currently of interest in a variety of areas. Such procedures typically alter the physical and compositional structure of materials to a depth of less than ∼1 μm, thereby requiring surface‐sensitive techniques to reveal the properties of the resulting systems. To this end a method has been devised in which a small mechanical marginal oscillator acts as a substrate for the material(s) of interest, allowing investigation of changes in specifically mechanical properties to be monitored in situ during ion implantation or other material modifying procedures.