By Topic

GaAs double heterostructure lasers fabricated by wet chemical etching

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Merz, J.L. ; Bell Laboratories, Murray Hill, New Jersey 07974 ; Logan, R.A.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.323191 

GaAs double heterostructure lasers compatible with monolithic intergration of optical devices have been fabricated by wet chemical etching. Results for a variety of laser orientations are reported. External differential quantum efficiencies as high as 18% have been achieved, as well as threshold current densities as low as 4.2 kA/cm2. An analysis for the evaluation of etched‐mirror properties is presented. Using this analysis, it was found that etched mirrors had reflectivity R?0.22±0.05 and scattering losses S=0.3±0.1.

Published in:

Journal of Applied Physics  (Volume:47 ,  Issue: 8 )