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NAND Flash Scaling Beyond 20nm

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1 Author(s)
Yohwan Koh ; Flash Dev. Div., Hynix Semicond. Inc., Icheon

With the advent of prevailing mobile devices in our daily lives, the densities of nonvolatile memory, especially NAND Flash suitable for mobile devices become higher and higher, and Flash memory applications will be constantly increased in the future due to their non-volatility and high capacity. Therefore it is very meaningful and important to summarize where NAND Flash memory technology is now, what kinds of challenges have to be overcome, and what the promising candidates will be in the future. In this paper, we present the major scaling issues and performance requirements for NAND Flash with advancing technology nodes, and we also show directions for new emerging technologies beyond 20 nm technology node.

Published in:

Memory Workshop, 2009. IMW '09. IEEE International

Date of Conference:

10-14 May 2009