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A focused argon‐ion laser beam (λ=350 nm) is used to fabricate optical channel waveguides on oxidized silicon wafers using a commerically available spin‐on polymer. The polymerization process is photon induced, thus allowing the reaction to occur in a room‐temperature ambient. This allows the fabrication of waveguides on a variety of substrates including those with low melting points. The losses in these waveguides are typically less then 1 dB/cm, making them applicable to a variety of optical interconnect problems. In particular, we demonstrate their use in the fabrication of an optical power tap.