Cart (Loading....) | Create Account
Close category search window

X‐ray reflectivity and transmission electron microscopy studies on thin and ultrathin W/C and W/Si multilayers structures

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Vidal, B.A. ; CNRS, Faculté des Sciences de St. Jérome, Université d’Aix‐Marseille III, Avenue de l’escadrille Normandie‐Niemen, 13397 Marseille Cedex 13, France ; Marfaing, J.C.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Ultrathin and thin bilayers of W coupled with C and Si have been deposited by rf magnetron sputtering. Behavior of the multilayer structures (MLS) has been analyzed through two combined techniques: x‐ray reflectivity and electron microscopy study and conventional (TEM) and high‐resolution transmission (HRTEM). The experimental results we present provide average informations on the reflective characteristics of the mirrors in agreement with theory, comparative values of parameters (thickness and interfacial roughness of the bilayers), as well as structural characteristics of the stackings. We focused on ultrathin W/Si MLS with a bilayer thickness of 1.5 nm that present excellent regularity with effective roughness less than 3 Å. They offer reflective qualities to be used as reflectors with an angle 2θ≫6° in the first order for the medium x‐ray range.

Published in:

Journal of Applied Physics  (Volume:65 ,  Issue: 9 )

Date of Publication:

May 1989

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.