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Composition and deposition temperature dependence of the structure of oxidized thin‐film amorphous Tb‐Fe

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6 Author(s)
Hellman, F. ; AT&T Bell Laboratories, Murray Hill, New Jersey 07974 ; Nakahara, S. ; Frankenthal, R. P. ; van Dover, R. B.
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The microstructure of oxidized amorphous Tb‐Fe alloy thin films prepared by magnetron cosputtering has been studied as a function of alloy composition and the substrate temperature at which the films were grown. Transmission electron microscopy and Auger electron spectroscopy with ion‐sputter depth profiling were used to characterize the films. The composition of the alloy has no dramatic effect on the oxidation rate; it does, however, effect the microstructure of the α‐Fe2O3 layer that forms on the alloy. Oxidized alloys originally containing more than 27 at. % Tb show an extremely fine‐grained structure, with grain sizes on the order of 30 Å. Alloys containing less Tb developed large (1–2 μm) [001]‐oriented single‐crystal α‐Fe2O3 grains amongst the fine‐grained α‐Fe2O3. For alloys with less then 18 at. % Tb, only the large grains remain. Samples grown at deposition temperatures ranging from 85 K to 400 °C show a similar structure after oxidation.

Published in:

Journal of Applied Physics  (Volume:65 ,  Issue: 7 )

Date of Publication:

Apr 1989

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