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Concentration profiles of composing ions in radio frequency sputtered Sr (Zr0.2Ti0.8)O3 films

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4 Author(s)
Matsuoka, Tomizo ; Central Research Laboratories, Matsushita Electric Industrial Co., Ltd., 3‐15 Yagumo‐nakamachi, Moriguchi, Osaka 570, Japan ; Kuwata, Jun ; Fujita, Yosuke ; Abe, Atsushi

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Sr(Zr0.2 Ti0.8 )O3 dielectric thin film for electroluminescent devices was prepared by in‐line‐type rf magnetron sputtering method using oxide target. Novel phenomenon of periodic concentration fluctuations of the composing ions was observed in SIMS in‐depth profiles. Partial concentration anomaly with Sr deficiency was also observed in the first‐to‐grow region of the film. The periodic concentration fluctuations were confirmed to be ascribed to periodic appearance of Sr(Zr1-x Tix )O3 with x larger than 0.8.

Published in:

Journal of Applied Physics  (Volume:64 ,  Issue: 7 )

Date of Publication:

Oct 1988

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