By Topic

Effects of hydrogen and nitrogen ion bombardments on soft magnetism of iron films during double‐ion‐beam sputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Nagakubo, M. ; Department of Physical Electronics, Tokyo Institute of Technology, 2‐12‐1 Oh‐okayama Meguro‐ku, Tokyo 152, Japan ; Yamamoto, T. ; Naoe, M.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The dependence of the crystal structure and magnetic properties of iron films on preparation conditions has been investigated in detail by using a double‐ion‐beam sputtering system. During sputtering of an iron target by argon ions, the growing surfaces of iron films were bombarded by nitrogen or hydrogen ions with different kinetic energies below 500 eV. It has been found that these ions changed significantly the film structure and magnetic properties through the process of collision and reaction with iron atoms at the surface layer of growing film. As a result, the small amount of hydrogen or nitrogen added into iron films by ion bombardment improved effectively the soft magnetic properties of iron films. The iron films with saturation magnetization 4πMs as large as 22 kG and coercive force Hc as low as about 5 Oe were prepared by adjusting the accelerating voltage in the range of 100–300 V and the partial pressure of hydrogen or nitrogen in the range of 10-4 –10-5 Torr.

Published in:

Journal of Applied Physics  (Volume:63 ,  Issue: 8 )