Cart (Loading....) | Create Account
Close category search window
 

Prebaking and silicon epitaxial growth enhanced by UV radiation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Ishitani, A. ; Fundamental Research Laboratories, NEC Corporation, 1‐1 Miyazaki 4‐chome, Miyamae‐ku, Kawasaki, Kanagawa 213, Japan ; Ohshita, Y. ; Tanigaki, K. ; Takada, K.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.337983 

UV light irradiation effects on prebaking and silicon epitaxial growth is studied. An ArF excimer laser, a KrF excimer laser, and a Hg‐Xe lamp are used as light sources. The epitaxial growth is carried out using a SiH2Cl2/H2 system under reduced pressure. ArF radiation and Hg‐Xe radiation are found to be effective for volatilizing native SiO2 on silicon‐substrate surfaces even at low temperatures. When a substrate surface is irradiated with these UV radiations during prebaking and epitaxial growth, epilayer surface morphology and crystalline quality are much improved. Furthermore, the epitaxial growth rate seems to be enhanced photothermally by excimer laser radiations, and photochemically by Hg‐Xe radiation.

Published in:

Journal of Applied Physics  (Volume:61 ,  Issue: 6 )

Date of Publication:

Mar 1987

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.