By Topic

Sputtered amorphous Fe–Te films: Structural and electrical studies

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
3 Author(s)
Chiba, Kiyoshi ; Central Research Laboratories, Teijin Ltd., Hino, Tokyo 191, Japan ; Tokumitsu, Kazuto ; Ino, Hiromitsu

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Thin films of an iron–tellurium alloy were prepared by rf sputtering and characterized by means of x‐ray diffraction and Mössbauer spectroscopy. In an immiscible range in equilibrium composition, tellurium atoms were incorporated into iron, distorting the lattice to some extent. Beyond 14 at. % of Te, an amorphous structure appeared. Judging from the metastable superstructures formed at higher substrate temperatures and the covalent nature in the bonding, the kinetic hindrance against the redistribution of the elements due to the local atomic forces during rapid quenching plays a critical role in the formation of amorphous structure in this alloy. In addition, beyond some intermetallic range around 60 at. % Te, an amorphous phase also exists in the tellurium‐rich region. The thermal stability was examined by a differential scanning calorimetry; the electrical resistivity is also discussed.

Published in:

Journal of Applied Physics  (Volume:60 ,  Issue: 3 )