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Influence of process parameters on the electrical properties of plasma‐sprayed silicon

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3 Author(s)
Akani, M. ; Laboratoire de Physique des Solides, Centre National de la Recherche Scientifique, 92195 Meudon, France ; Suryanarayanan, R. ; Brun, G.

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Plasma spray has been used to prepare n‐ and p‐type polycrystalline deposits. The influence of process parameters on the electrical properties are reported. The origin of impurities such as Fe, Ni, and Al is pointed out. Heat treatment of the deposits is shown to increase the density and the mobility.

Published in:

Journal of Applied Physics  (Volume:60 ,  Issue: 1 )

Date of Publication:

Jul 1986

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