Close category search window
 

A micromachined V-band CMOS bandpass filter with 2-dB insertion-loss

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Jin-Fa Chang ; Dept. of Electr. Eng., Nat. Chi Nan Univ., Puli ; Yo-Sheng Lin ; Pen-Li Huang ; Shey-Shi Lu

A low-insertion-loss V-band CMOS bandpass filter is demonstrated. The proposed filter architecture has the following feature: the low-frequency transmission-zero (omegaz1) and the high-frequency transmission-zero (omegaz2) can be tuned by the series-feedback capacitor Cs and the parallel-feedback capacitor Cp, respectively. To reduce the substrate loss, the CMOS process compatible backside inductively-coupledplasma (ICP) deep trench technology is used to selectively remove the silicon underneath the filter. After the ICP etching, this filter achieved insertion-loss (1/S21) lower than 3 dB over the frequency range of 52.5-76.8 GHz. The minimum insertion-loss was 2 dB at 63.5 GHz. To the authors' knowledge, this is the best result ever reported for a V-band CMOS bandpass filter in the literature.

Published in:
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th

Date of Conference: 26-29 May 2009

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.