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Acrylic-based resin with favorable properties for three-dimensional two-photon polymerization

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7 Author(s)
Baldacchini, T. ; Eugene F. Merkert Chemistry Center, Boston College, Chestnut Hill, Massachusetts 02467 ; LaFratta, Christopher N. ; Farrer, Richard A. ; Teich, Malvin C.
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We describe an acrylic-based prepolymer resin that is ideally suited for the fabrication of three-dimensional structures with two-photon polymerization. We characterize the photochemical and photophysical properties of the photoinitiator and present representative structures that demonstrate the favorable mechanical and optical properties of the polymer. © 2004 American Institute of Physics.

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Journal of Applied Physics  (Volume:95 ,  Issue: 11 )