By Topic

Exponentially fitted discretization schemes for diffusion process simulation on coarse grids

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Mijalkovic, S. ; Fac. of Electron. Eng., Nis Univ., Serbia

This paper examines formulation of the discretization schemes for diffusion process simulation that allow coarse grid spacings in the areas of exponentially varying concentrations and fluxes. The method of integral identities is used as a common framework for exponential fitting of both the finite difference and finite element schemes. An exponentially fitted finite difference scheme, with discrete flux terms analogous to those used in Scharfetter-Gummel scheme is justified. An extension of the integral identities in projection form to higher dimensions and a corresponding multidimensional exponentially fitted finite element scheme are proposed. Two-dimensional test computations show clear superiority of the exponentially fitted schemes over the standard approaches as well as robustness of a new finite element scheme regarding irregular grid geometry

Published in:

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on  (Volume:15 ,  Issue: 5 )