Cart (Loading....) | Create Account
Close category search window
 

Deposition of Co-Cr films by magnetron sputtering with highly efficient target utilization

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Takahashi, Takakazu ; Dept. of Electron. & Comput. Eng., Toyama Univ., Japan ; Hata, Tomonobu ; Naoe, Masahiko

A new type of magnetron sputtering method which can highly improve the utilization efficiency of a Co-Cr alloy target and suppress the bombardment of high-energy particles to substrate has been developed by forming the uniform magnetic flux confined in front of the target plane. The target utilization efficiencies in area and volume were as high as about 90% and 65%, respectively. The maximum deposition rate was about 0.26 μ/min. All Co-Cr films deposited by using this method were composed of HCP phase crystallites with c-axis orientation Δθ50 ranging from 8 to 14°. The easy direction of magnetization was perpendicular to the film plane. The saturization magnetization Ms and the perpendicular coercivity Hc⊥ are in the ranges of 400-550 emu/cm3 and more than 1000 Oe, respectively. Accordingly, a plasma confining type of sputtering method may be useful for depositing Co-Cr films at a high rate and high target utilization efficiency without damage by plasma

Published in:

Magnetics, IEEE Transactions on  (Volume:26 ,  Issue: 1 )

Date of Publication:

Jan 1990

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.