By Topic

Control of internal stress of Co-Cr films deposited by facing targets sputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
S. Nakagawa ; Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan ; Y. Kitamoto ; M. Naoe

The reduction of excessively large internal stress to zero has been succeeded by adjusting working gas pressure to the proper value in the range below 1 mtorr in a facing targets sputtering (FTS) system. In addition, the internal stress depends on the distance between facing targets in the FTS system. The origins of such a change of internal stress can be attributed to the bombarding effect by energetic particles recoiled at the target's surface with a high ejection angle

Published in:

IEEE Transactions on Magnetics  (Volume:26 ,  Issue: 1 )