An investigation of the effect of the total gas pressure on the deposition of microcrystalline thin films form highly diluted silane in hydrogen discharges was carried out at two different frequencies. The study was performed in conditions of constant power dissipation and constant silane partial pressure in the discharge while using a series of plasma diagnostics as electrical, optical, mass spectrometric, and in situ deposition rate measurements together with a simulator of the gas phase and the surface chemistry of SiH4/H2 discharges. The results show that both the electron density and energy are affected by the change of the total pressure and the frequency. This in turn influences the rate of high energy electron–SiH4 dissociative processes and the total SiH4 consumption, which are favored by the frequency increase for most of the pressures. Furthermore, frequency was found to have the weakest effect on the deposition rate that was enhanced at 27.12 MHz only for the lowest pressure of 1 Torr. On the other hand, the increase of pressure from 1 to 10 Torr has led to an optimum of the deposition rate recorded at 2.5 Torr for both frequencies. This maximum is achieved when the rate of SiH4 dissociation to free radical is rather high; the flux of species is not significantly hindered by the increase of pressure and the secondary gas phase reactions of SiH4 act mainly as an additional source of film precursors.