By Topic

Distribution of defects induced in fused silica by ultraviolet laser pulses before and after treatment with a CO2 laser

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Stevens-Kalceff, Marion A. ; School of Physics, University of New South Wales, Sydney, New South Wales 2052, Australia ; Wong, Joe

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1922591 

The depth distribution of ultraviolet laser irradiation-induced defects in fused silica has been determined using cathodoluminescence (CL) microanalysis. CL emissions have been observed at 1.9, 2.2, 2.7, and 4.4 eV. In addition, following a CO2 laser treatment for damage mitigation, an emission at 3.2 eV is also observed. The CL emissions have been identified with the nonbridging oxygen hole center, the self-trapped exciton, the oxygen-deficient center, and the aluminum impurity center. The spatially resolved CL data are consistent with the damage initiation at the exit surface. The concentration of 355-nm laser-induced defects is greatest at the surface and monotonically decays to preirradiation levels at ∼10-μm depth below the surface. The CO2 processing reduces the defect concentration and spatial distribution to a maximum depth of ∼6 μm, confirming significant damage mitigation.

Published in:

Journal of Applied Physics  (Volume:97 ,  Issue: 11 )