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Browse Journals & Magazines > Journal of Applied Physics ...> Volume:97 Issue:10 Help

In situ measurement of surface stress evolution during sputter deposition of CoCrX/Cr (X=Pt,Ta) thin film and its magnetic properties

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3 Author(s)
Park, J.K. ; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, South Korea ; Ha, G.W. ; Oh, D.Y.

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The measurement of force per width of CoCrX/Cr (X=Pt,Ta) bilayer showed that both the surface state and surface stress of CoCrX layer can be controlled by controlling the surface stress of Cr underlayer through the variation of its thickness and of the deposition conditions such as the deposition rate and temperature. The dynamic surface of CoCrX layer showing a compressive surface stress was a critical factor to determine its coercivity. This was because the phase decomposition of CoCrX alloy can be largely promoted at the compressive dynamic surface because of its high mobility.

Published in:
Journal of Applied Physics  (Volume:97 ,  Issue: 10 )

Date of Publication: May 2005

Page(s):
10N116 - 10N116-3
ISSN :
0021-8979
Digital Object Identifier :
10.1063/1.1854253
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
May 2005

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