Crystallization of amorphous data marks in crystalline Ga15Sb85 and Ge,In doped SbTe phase-change material was studied in situ in a Transmission Electron Microscope (TEM). Electron irradiation induced crystallization was obtained at room temperature using a 120 kV beam. In general, electron beam (e--beam) induced crystallization started from the amorphous-crystalline interface and was growth dominated for both materials. A dependence of growth velocity on electron beam intensity and crystal direction was observed. A comparison with laser-crystallized amorphous marks was made. For laser-induced crystallization also crystal growth from the amorphous-crystalline interface was seen. However, differences in morphology between the e--beam and laser-recrystallized data marks of the GaSb phase-change material were observed. The electron beam erased data marks contained crystals with (extremely) large periodicities found in three dimensions. For the Ge,In doped SbTe phase-change material identical morphologies were observed for the e--beam and laser-recrystallized data marks. Both methods that induce crystallization displayed a rhombohedral Sb structure, the same structure as the laser-crystallized surroundings.