Cart (Loading....) | Create Account
Close category search window
 

Incoherent neutron scattering and the dynamics of thin film photoresist polymers

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Soles, Christopher L. ; Polymers Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899-8541 ; Douglas, Jack F. ; Lin, Eric K. ; Lenhart, Joseph L.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1539538 

Elastic incoherent neutron scattering is employed to parameterize changes in the atomic/molecular mobility in lithographic polymers as a function of film thickness. Changes in the 200 MHz and faster dynamics are estimated in terms of a harmonic oscillator model and the corresponding Debye–Waller factor mean-square atomic displacement 2>. We generally observe that relatively large 2> values in the glassy state lead to a strong suppression of 2> when the polymer is confined to exceedingly thin films. In contrast, this thin film suppression is diminished or even absent if 2> in the glass is relatively small. We further demonstrate that highly localized side group or segmental dynamics of hydrogen-rich moieties, such as methyl groups, dominate 2> and that thin film confinement apparently retards these motions. With respect to photolithography, we demonstrate that a reduced 2> in exceedingly thin model resist films corresponds to a decrease in the reaction front propagation kinetics. © 2003 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:93 ,  Issue: 4 )

Date of Publication:

Feb 2003

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.