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Transparent thin film transistors using ZnO as an active channel layer and their electrical properties

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6 Author(s)
Masuda, Satoshi ; Minolta Co., Ltd., 1-2 Sakuramachi, Takatsuki, Osaka 569-8503, Japan ; Kitamura, Ken ; Okumura, Yoshihiro ; Miyatake, Shigehiro
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Bottom-gate-type thin film transistors using ZnO as an active channel layer (ZnO–TFT) have been constructed. The ZnO layers were deposited using pulsed laser deposition at 450 °C at an oxygen pressure of 3 m Torr, and the material that was formed had a background carrier concentration of less than 5×1016cm-3. A double layer gate insulator consisting of SiO2 and SiNx was effective in suppressing leakage current and enabling the ZnO–TFT to operate successfully. The Ion/Ioff ratio of ZnO–TFTs fabricated on Si wafers was more than 105 and the optical transmittance of ZnO–TFTs fabricated on glass was more than 80%. These results show that it is possible to fabricate a transparent TFT that can even be operated in the presence of visible light. © 2003 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:93 ,  Issue: 3 )