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Development of microstructure in Cr and Cr/CoCrPt films made by pulsed laser deposition

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2 Author(s)
Shima, M. ; Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139 ; Ross, C.A.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1529295 

Cr films and Cr/CoCrPt bilayer films have been grown using ion-beam-assisted pulsed laser deposition (PLD). High mobility conditions such as a substrate temperature above 350 °C, a low deposition rate, and a high laser energy promote the formation of a {100} bcc crystallographic preferred orientation in the Cr layer, while a {110}-oriented film is formed under other conditions. The {100} orientation can be formed at lower temperatures if the film is bombarded by energetic Ar ions during growth. CoCrPt grows with the hcp-{112¯0} orientation on bcc-Cr {100} underlayers, which is the same epitaxial relationship that occurs in sputtered Cr/Co-alloy films used in hard disk recording media. PLD CoCrPt films also have magnetic properties broadly similar to those of sputtered films. The PLD film microstructure development is interpreted in terms of the preferential nucleation of {100}-oriented Cr crystals during the early stages of film growth. © 2003 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:93 ,  Issue: 2 )

Date of Publication:

Jan 2003

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