Cart (Loading....) | Create Account
Close category search window
 

Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Rousseau, A. ; Laboratoire de Physique des Gaz et des Plasmas, CNRS, Université Paris-Sud, Bâtiment 210, 91405 Orsay Cedex, France ; Teboul, E. ; Lang, N. ; Hannemann, M.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1497454 

Langmuir probe techniques have been used to study time and spatially resolved electron densities and electron temperatures in pulse-modulated hydrogen discharges in two different planar microwave reactors (fmicrowave=2.45 GHz, tpulse= 1 ms). The reactors are (i) a standing-wave radiative slotted waveguide reactor and (ii) a modified traveling-wave radiative slotted waveguide reactor, which generate relatively large plasmas over areas from about 350 to 500 cm2. The plasma properties of these reactor types are of particular interest as they have been used for basic research and for plasma processing; for example, for surface treatment and layer deposition. In the present study the pressures and microwave powers in the reactors were varied between 33 and 55 Pa and 600 and 3600 W, respectively. In regions with high electromagnetic fields, shielded Langmuir probes were used to avoid disturbances of the probe characteristic. Close to the microwave windows of the reactors both the electron density and the electron temperature showed strong inhomogeneities. In the standing-wave reactor the inhomogeneity was found to be spatially modulated by the position of the slots. The maximum value of the electron temperature was about 10 eV, and the electron density varied between 0.2 and 14×1011 cm-3. The steady-state electron temperature in a discharge pulse was reached within a few tens of microseconds, whereas the electron density needed some hundreds of microseconds to reach a steady state. Depending on the reactor the electron density reached a maximum between 80 and 200 μs after the beginning of the pulse. © 2002 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:92 ,  Issue: 7 )

Date of Publication:

Oct 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.