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Electron energy deposition in an electron-beam pumped KrF amplifier: Impact of the gas composition

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3 Author(s)
Giuliani, J.L. ; Plasma Physics Division, Naval Research Laboratory, Washington, DC 20375 ; Petrov, G.M. ; Dasgupta, A.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1491592 

Calculations for electron deposition in electron beam generated KrF laser at atmospheric pressure have been performed. The impact of the Ar/Kr/F2 gas mixture on the electron energy distribution function, electron density, and mean energy, energy per electron–ion pair, attachment, dissociation, excitation, and ionization rates have been investigated. The F2 abundance controls the low energy (>~9 eV) component of the distribution function, while both the fluorine and krypton mole fraction affect the distribution in the midenergy domain (9 to ∼25 eV). Consequently, the F2 attachment rate coefficient varies with the F2 mole fraction (xF2) such that the electron density scales as 1/xF20.7. The rate coefficient for direct dissociation of F2 is smaller than for attachment but the former contributes more to the total power dissipation (∼8% at xF2=0.01). The excitation-to-ionization ratio for Kr is not constant, as generally assumed, but increases by a factor of two with a decrease in either the Kr or F2 abundance. Combining the former and present investigations leads to a set of fitting formulas to be used in beam kinetics codes for various collision rates as a function of both the electron beam power density and the composition. © 2002 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:92 ,  Issue: 3 )

Date of Publication:

Aug 2002

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