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Photolithography of thick photoresist coating in anisotropically etched v-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

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4 Author(s)
Lei Wei ; Dept. of Photonics Eng., Tech. Univ. of Denmark, Lyngby ; Khomtchenko, E. ; Alkeskjold, T.T. ; Bjarklev, A.

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

Published in:

Optical Fiber Communication - incudes post deadline papers, 2009. OFC 2009. Conference on

Date of Conference:

22-26 March 2009