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Photolithography of thick photoresist coating in anisotropically etched v-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

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4 Author(s)
Lei Wei ; Dept. of Photonics Eng., Tech. Univ. of Denmark, Lyngby ; Khomtchenko, E. ; Alkeskjold, T.T. ; Bjarklev, A.

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

Published in:
Optical Fiber Communication - incudes post deadline papers, 2009. OFC 2009. Conference on

Date of Conference: 22-26 March 2009

Page(s):
1 - 3
E-ISBN :
978-1-55752-865-0
Print ISBN:
978-1-4244-2606-5
INSPEC Accession Number:
10689633
Conference Location :
San Diego, CA

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