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Photosensitivity of Ge-doped silica deposited by hollow cathode PECVD

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4 Author(s)
Bazylenko, M.V. ; Dept. of Electr. Eng., New South Wales Univ., Kensington, NSW, Australia ; Gross, M. ; Chu, P.L. ; Moss, D.

It is demonstrated that a novel thin film growth technique, hollow cathode PECVD, previously used to produce low-loss glass waveguides, can also produce intrinsically (no hydrogen loading) very photosensitive (to UV) germanosilicate waveguide material. In addition, the sign of the photosensitivity can be altered by varying the growth conditions

Published in:

Electronics Letters  (Volume:32 ,  Issue: 13 )