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Structural study of a thermally diffused Al/Ni bilayer via x-ray absorption spectroscopy and x-ray photoelectron spectroscopy

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4 Author(s)
Chevrier, France ; Laboratoire pour l’Utilisation du Rayonnement Electromagnétique (LURE), Centre Universitaire Paris-Sud, Bâtiment 209A, BP34, 91898 Orsay Cedex, France ; Delobbe, Anne ; Traverse, Agnes ; Zanghi, Didier

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Ni thin films deposited on (111) Al thick samples have been submitted to annealing treatment. The goal is to identify the phases formed in the early stage of mixing between Ni and Al. Combining complementary techniques such as x-ray absorption spectroscopy and x-ray photoelectron spectroscopy, we characterized two different systems depending on the temperature conditions. For a thermal treatment at 110 °C, a system formed of small AlNi3 clusters embedded in the Al matrix was identified. This was interpreted as due to the existence of a spontaneous Al/Ni interface mixed layer acting as a seed for the AlNi3 cluster formation. After annealing at 300 °C, the Al3Ni intermetallic compound was detected, in agreement with results in the literature. © 2001 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:90 ,  Issue: 6 )

Date of Publication:

Sep 2001

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