Close category search window
 

Comment on “Analysis of high-resolution x-ray diffraction in semiconductor strained layers” [J. Appl. Phys. 86, 782 (1999)]

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
Fatemi, M. ; Electronics Science and Technology Division, U.S. Naval Research Laboratory, Washington D.C. 20375-5000

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.373524 

The multilinear regression analysis proposed for optimizing the measurements and minimization of errors in the x-ray peak separation method is examined. It is shown that the interpretation of the residuals as the errors of the physical variables leads to paradoxical conclusions, and prevents the definition of a unique numerical value for the probable error. It is also shown that if the method is to yield a permissible set of lattice parameters, the residuals of the best fit must fall within the range of experimental uncertainties estimated in advance. Thus, the residuals are only useful as a measure of the internal consistency among the data, but they cannot be used to quantify or minimize the errors within that set. © 2000 American Institute of Physics.

Published in:
Journal of Applied Physics  (Volume:87 ,  Issue: 11 )

Date of Publication: Jun 2000

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.