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Complete thermal characterization of film-on-substrate system by modulated thermoreflectance microscopy and multiparameter fitting

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4 Author(s)
Li, Bincheng ; Laboratoire d’Instrumentation, Université Pierre et Marie Curie, Laboratoire d’Optique de l’ESPCI, UPR A0005 du CNRS, 10 rue Vauquelin, 75005 Paris, France ; Roger, J.P. ; Pottier, L. ; Fournier, D.

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Modulated thermoreflectance microscopy is applied to a complete thermal characterization of a thin film of gold (78 nm) or YBaCuO (300 nm) on a LaAlO3 substrate. The phase profile, measured at several modulation frequencies covering an appropriate range, is fitted with a rigorous thermal diffusion model. This leads to a simultaneous estimation of the thermal diffusivities of the film and the substrate, as well as of the thermal film/substrate boundary resistance. The estimated values for the gold film sample are, respectively, 4.3×10-6m2 s-1 (substrate diffusivity), 1.0×10-4m2 s-1 (film diffusivity), and 1.0×10-8m2 KW-1 (thermal boundary resistance), while for the thermally anisotropic YBaCuO film sample are, 4.1×10-6m2 s-1, 3.5×10-6m2 s-1 (in-plane diffusivity), and 8.0×10-8m2 KW-1, respectively. © 1999 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:86 ,  Issue: 9 )