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Electron-beam irradiation-induced nonlinearity in silicate glass films and fabrication of nonlinear optical gratings

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5 Author(s)
Nakanishi, Makoto ; The Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8011, Japan ; Sugihara, O. ; Okamoto, N. ; Fujimura, Hisashi
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Electron-beam (EB) irradiation on rf-sputtered silicate glass thin films can produce second-order nonlinearity. EB-poled germanosilicate glass film shows a maximum nonlinear optical (NLO) coefficient of d33=0.33 pm/V. It is found that the nonlinearity is homogeneous throughout the film layer and depends on both the EB current and dose. Moreover, a NLO grating, i.e., χ(2) grating, is realized using a periodic EB writing technique. © 1999 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:86 ,  Issue: 5 )