By Topic

Growth of epitaxial CoSi2 on SiGe(001)

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
4 Author(s)
Boyanov, B.I. ; Department of Physics and Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 ; Goeller, P.T. ; Sayers, D.E. ; Nemanich, R.J.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.370894 

A technique for achieving epitaxial growth of (001)-oriented CoSi2 on strained epitaxial layers of Si1-xGex(001) is described. The technique is based on a variation of the template method, and is designed to control the local environment of Co atoms at the CoSi2/SiGe interface. The effects of the Co–Ge interactions on the interfacial reaction and the epitaxial orientation and the morphology of the silicide film were investigated. This reaction was found to cause pitting in (001)-oriented CoSi2 films, and to stabilize the (221) orientation for films codeposited under conditions where CoSi2(001) growth is achieved on Si(001) substrates. The (221)-oriented CoSi2 films were islanded after annealing at 700 °C. The islands were terminated by (111) and (110) facets inclined at 15.8° and 19.5°, respectively, from CoSi2 [221] towards CoSi2 [114]. These results were interpreted in terms of reduction of interfacial and surface energies, and geometric effects. Silicide films up to 730-Å-thick were deposited and annealed up to 900 °C. The films were stable against agglomeration, and retained tensile stress in the CoSi2 layer after annealing at 700 °C. The rms roughness of the CoSi2 films was com- parable to that of the Si(001) substrate—less than 15 Å over areas as large as 20×20 μm2. Films annealed at 900°C were severely agglomerated. © 1999 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:86 ,  Issue: 3 )