The distribution of self-bias potential (Vdc) on a powered electrode of a supermagnetron plasma system, where both electrodes are supplied phase-shifted radio frequency (rf) currents, was measured using five electrical probes buried in the electrode. For comparison, the same was measured for a conventional magnetron plasma system. Measurements were carried out with an Ar discharge at the pressure region of 4–50 mTorr. The data obtained with the supermagnetron and the conventional magnetron plasm systems were used to map the Vdc distribution on the powered electrodes of each plasma source. When the phase difference between rf currents applied to the two parallel electrodes of supermagnetron plasma system were changed, a drastic change of the Vdc is observed. The uniformity of the Vdc distribution is greatly improved when the phase difference between rf currents is varied from 0° to about 180°. The further increase of phase difference between two rf currents causes a decrease of the uniformity of the Vdc distribution. The uniformity of the Vdc obtained on the electrode of supermagnetron plasma source with 180° phase-shifted currents is observed to be superior to that of the conventional magnetron plasma source. © 1999 American Institute of Physics.