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Browse Journals & Magazines > Journal of Applied Physics ...> Volume:86 Issue:11 Help

The effect of frequency and duty cycle of a pulsed microwave plasma on the chemical vapor deposition of diamond

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2 Author(s)
Khachan, J. ; Department of Plasma Physics, School of Physics, University of Sydney, Australia 2006 ; Gardner, D.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.371623 

We examine the effect of a pulsed microwave discharge on the deposition rate of polycrystalline diamond by varying the pulse repetition rate and duty cycle. A simple model of the dynamic plasma chemistry is developed in order to explain the increase in growth rate with frequency for the same average power. Changing the duty cycle while keeping the total plasma on-time constant resulted in the same film thickness for all duty cycles. One possible implication of this is that growth takes place when the pulse is on. © 1999 American Institute of Physics.

Published in:
Journal of Applied Physics  (Volume:86 ,  Issue: 11 )

Date of Publication: Dec 1999

Page(s):
6576 - 6579
ISSN :
0021-8979
Digital Object Identifier :
10.1063/1.371623
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Dec 1999

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